Anisotropic non-plasma HCl gas etching of (010) β-Ga2O3 substrate

Material type: 記事

Author: Takayoshi Oshimaほか

Publisher: IOP Publishing

Publication date: 2023-06-15

Material Format: Digital

Journal name: Applied Physics Express 16 6

Publication Page: p.66501-66501

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Digital

Material Type: 記事
Title: Anisotropic non-plasma HCl gas etching of (010) β-Ga2O3 substrate
Author/Editor: Takayoshi Oshima
Yuichi Oshima
Author Heading: Takayoshi Oshima
https://orcid.org/0000-0001-8550-9735
Yuichi Oshima
https://orcid.org/0000-0001-8293-4891
Publication, Distribution, etc.: IOP Publishing
Publication Date: 2023-06-15
Publication Date (W3CDTF): 2023-06-15
Periodical title: Applied Physics Express
No. or year of volume/issue: 16 6
Volume: 16
Issue: 6
Pages: 66501-66501
ISSN (Periodical Title): ISSN : 18820778
Text Language Code: eng
Subject Heading: Ga2O3
HCl gas etching
Target Audience: 一般
DOI: 10.48505/nims.4267
Format (IMT): application/vnd.openxmlformats-officedocument.wordprocessingml.document
Source: APEX-107351.docx
https://mdr.nims.go.jp/downloads/5h73q3199
Access Restrictions: インターネット公開
Rights (production): © 2023 The Japan Society of Applied Physic <br> This is an author-created, un-copyedited version of an article accepted for publication/published in Applied Physics Express. IOP Publishing Ltd is not responsible for any errors or omissions in this version of the manuscript or any version derived from it. The Version of Record is available online at https://doi.org/10.35848/1882-0786/acdbb7.
Data Provider (Database): 国立情報学研究所 : 学術機関リポジトリデータベース（IRDB）（機関リポジトリ）
https://irdb.nii.ac.jp
Original Data Provider (Database): 物質・材料研究機構 : Materials Data Repository