Journal of photopolymer science and technology

• Material Type: 雑誌
• ISSN: 0914-9244
• ISSN-L: 0914-9244
• Title: Journal of photopolymer science and technology
• Volume: 11(1)-11(4):1998
• Author Heading: フォトポリマー学会 フォトポリマー ガッカイ ( 001142273 )Authorities; Conference of Photopolymer Science and Technology ( 01236612 )Authorities; フォトポリマー懇話会 フォトポリマー コンワカイ ( 00283295 )Authorities
• Publication, Distribution, etc.: Chiba : The Society of Photopolymer Science and Technology
• Publication Date: 1998
• Publication Date (W3CDTF): 1998
• Note (Publication, distribution, etc.): Place of publication varies; Publisher: Technical Association of Photopolymers, Japan (v. 6, no. 1-v. 23, no. 6); The Conference of Photopolymer Science and Technology (v. 24, no. 1-v. 25, no. 6)
• Year and volume of publication: v. 6, no. 1 (1993)-
• Size: 29cm
• Place of Publication (Country Code): JP
• Text Language Code: eng
• NDLC: ZP48
• Note (General): Description based on the latest issue; Frequency varies
• Holding library: 国立国会図書館
• Call No.: Z53-W515
• Related Material: 区分換; https://ndlsearch.ndl.go.jp/books/R100000002-I000000065969
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 000000156586; http://id.ndl.go.jp/bib/000000156586
• National Bibliography No. (JPNO): 10050993
• Cataloging Rule: National Diet Library Cataloging Rules for Serials
• Bibliographic Record Category (NDL): 132

Table of Contents

Structural Design of Resin Matrix and Acid-labile Dissolution Inhibitor of Chemical Amplification Positive Electron-beam Resist for Gigabit Lithography

Negative EB Resist Materials Using Anisotropic Acid Diffusion Based on Acid-catalyzed Dehydration of Phenylcarbinols

Experimental EUV Exposure System Using a Synchrotron Source

Resist Surface Roughness Calculated Using Theoretical Percolation Model

Radiation Chemistry of Triphenylsulfonium Salts in EB and X-ray Chemically Amplified Resists-Proton Generation Mechanisms

Photocontrol of Alignment of Liquid Crystals Using a Polymethacrylate Bearing Azobenzene

Photo Alignment Materials with High Sensitivity to Near UV Light

Photopolymerization Behavior of Ferroelectric Liquid-Crystalline Monomers

Recent Development of Polymer Network Liquid Crystal Displays

Electrooptical Properties of a Polymer/LC Grating Fabricated by UV Irradiation

Issues and Perspectives for Giga to Tera Scale Integration

Evolution and Progress of Deep UV Resist Materials

Photochemical Proton Generation Mechanism in Poly-methacrylate Resist Films

Advances in Patterning Characteristics of Chemically Amplified Resists with an Organic Base

New Single-component Resists Based on Functional Polynorborneneimides by Chemical Amplification for Deep UV Lithography

The Photopolymer Science and Technology Award--Francis M.Houlihan,et al."A Commerially Viable 193 nm Single Layer Resist Platform"

Electroluminescent Characteristics of Al tris(8-hydroxy quinoline)

Synthesis of Novel Fluorescent Reagents with a Carbodiimide Moiety and Their Applications of DNA Probe

Photo decomposition of Aliphatic Polyesters(5)

Photochromism of Dimethylaminoazobenzene in a Molecular Glass of 4′,4″,4-Tri(N-carbazolyl)triphenylamine