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図書

Proceedings : the Fourth International Symposium on Sputtering & Plasma Processes, ISSP '97 : subject, sputtering & plasma processes for advanced devices, June 4-6, 1997, Kanazawa Institute of Technology, Kanazawa, Ishikawa Japan / sponsored by the Study Committee of Sputtering & Plasma Processes, Japan Technology Transfer Association ; assisting societies, The Japan Society of Applied Physics ... [et al.].

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Proceedings : the Fourth International Symposium on Sputtering & Plasma Processes, ISSP '97 : subject, sputtering & plasma processes for advanced devices, June 4-6, 1997, Kanazawa Institute of Technology, Kanazawa, Ishikawa Japan / sponsored by the Study Committee of Sputtering & Plasma Processes, Japan Technology Transfer Association ; assisting societies, The Japan Society of Applied Physics ... [et al.].

Call No. (NDL)
M18-A196
Bibliographic ID of National Diet Library
000003255672
Material type
図書
Author
International Symposium on Sputtering & Plasma Processes (4th : 1997 : Kanazawa)
Publisher
ISSP '97 Committee
Publication date
1997.
Material Format
Paper
Capacity, size, etc.
viii, 690 p. : ill. ; 30 cm.
NDC
-
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Notes on use

Note (General):

"Symposium program" and 3 papers inserted.Includes bibliographical references.

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Paper

Material Type
図書
ISSN
0917-2440
Publication, Distribution, etc.
Publication Date
1997.
Publication Date (W3CDTF)
1997
Extent
viii, 690 p. : ill. ; 30 cm.
Place of Publication (Country Code)
JP
Text Language Code
eng