Plasma etching for integrated silicon sensor applications

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Material Type: 博士論文
ISBN: 9040711771
Title: Plasma etching for integrated silicon sensor applications
Author/Editor: Yuan Xiong Li.
Author Heading: Li, Yuan Xiong.
Publication, Distribution, etc.: Delft : Delft University Press
Publication Date: 1995.
Extent: xi, 221 p. : ill. ; 24 cm.
Degree grantor/type: Technische Universiteit Delft
Date Granted: 1995.
Date Granted (W3CDTF): 1995
Note (Dissertation): 博士論文
Thesis (doctoral) --Technische Universiteit Delft, 1995.
Place of Publication (Country Code): NL
Text Language Code: eng
NDLC: ND
Note (General): Delft University of Technology.
Note (Bibliography): Includes bibliographies.
Summary in English and Dutch.
Holding library: 国立国会図書館
Call No.: M-DINL-2820
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000003379416
http://id.ndl.go.jp/bib/000003379416
Bibliographic Record Category (NDL): 216