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図書

Photomask and next-generation lithography mask technology 7 : Photomask Japan symposium : Apr 2000, Yokohama, Japan. (SPIE Proceedings ; 4066)

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Photomask and next-generation lithography mask technology 7 : Photomask Japan symposium : Apr 2000, Yokohama, Japan.

(SPIE Proceedings ; 4066)

Call No. (NDL)
M17-00-2214
Bibliographic ID of National Diet Library
000003448691
Material type
図書
Author
BACUS.ほか
Publisher
-
Publication date
-
Material Format
Paper
Capacity, size, etc.
v.
NDC
-
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Notes on use

Note (General)：

Selected papers.Index term: photomask technology ; next generation lithography mask technology ; SPIE.

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Paper

Material Type
図書
ISBN
0819437026
ISSN
0277-786X
Title
Photomask and next-generation lithography mask technology 7 : Photomask Japan symposium : Apr 2000, Yokohama, Japan.
Series Title
SPIE Proceedings ; 4066
Author Heading
BACUS.
Photomask Japan.
SPIE-The International Society for Optical Engineering.
Extent
v.
Alternative Title
photomask technology ; next generation lithography mask technology ; SPIE
NDLC
M17
Note (General)
Selected papers.
Index term: photomask technology ; next generation lithography mask technology ; SPIE.