Photomask and X-ray mask technology 3 : 3rd International symposium : Apr 1996, Kawasaki, Japan. (SPIE Proceedings ; 2793)

Photomask and X-ray mask technology 3 : 3rd International symposium : Apr 1996, Kawasaki, Japan.

(SPIE Proceedings ; 2793)

Notes on use

Note (General)：: Selected papers.Also known as Photomask Japan '96.Index term: photomask technology ; X ray mask technology ; SPIE.

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Material Type: 図書
ISBN: 0819421790 (pbk)
Title: Photomask and X-ray mask technology 3 : 3rd International symposium : Apr 1996, Kawasaki, Japan.
Series Title: SPIE Proceedings ; 2793
Author Heading: Photomask Japan.
BACUS.
SPIE-The International Society for Optical Engineering.
Extent: v.
Alternative Title: Also known as Photomask Japan '96
photomask technology ; X ray mask technology ; SPIE
NDLC: M17
ND
Note (General): Selected papers.
Also known as Photomask Japan '96.
Index term: photomask technology ; X ray mask technology ; SPIE.
Holding library: 国立国会図書館
Call No.: M17-96-2014
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000003501283
http://id.ndl.go.jp/bib/000003501283
Bibliographic Record Category (NDL): 215