Photomask and X-ray mask technology 4 : 4th International Symposium : Apr 1997, Kawasaki, Japan. (SPIE Proceedings ; 3096)

Photomask and X-ray mask technology 4 : 4th International Symposium : Apr 1997, Kawasaki, Japan.

(SPIE Proceedings ; 3096)

Notes on use

Note (General)：: Selected papers.Also known as Photomask Japan '97.Index term: photomask technology ; X ray mask technology ; SPIE....

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Material Type: 図書
ISBN: 0819425168 (pbk)
ISSN: 0277-786X
Title: Photomask and X-ray mask technology 4 : 4th International Symposium : Apr 1997, Kawasaki, Japan.
Series Title: SPIE Proceedings ; 3096
Author Heading: Photomask Japan.
BACUS.
SPIE-The International Society for Optical Engineering.
Publication, Distribution, etc.: SPIE
Publication Date: 1997.
Publication Date (W3CDTF): 1997
Extent: v.
Alternative Title: Also known as Photomask Japan '97
photomask technology ; X ray mask technology ; SPIE
NDLC: M17
ND
Note (General): Selected papers.
Also known as Photomask Japan '97.
Index term: photomask technology ; X ray mask technology ; SPIE.
BL shelfmark: 6823.100 vol 3096 1997.
Holding library: 国立国会図書館
Call No.: M17-97-1726
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000003503996
http://id.ndl.go.jp/bib/000003503996
UKMARC No.: G05403582
Bibliographic Record Category (NDL): 215