Plasma process-induced damage : 2nd International symposium : May 1997, Monterey, CA.

Author: Institute of Electrical and Electronics Engineers. Electron Devices Society.ほか

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Note (General)：: Extended abstracts.Also known as P2ID. IEEE cat no 97TH8265.Index term: plasma process induced damage ; P2ID ; IEEE ; JSAP....

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Material Type: 図書
ISBN: 0965157717 (pbk)
0780338227 (microfiche)
Title: Plasma process-induced damage : 2nd International symposium : May 1997, Monterey, CA.
Author Heading: Institute of Electrical and Electronics Engineers. Electron Devices Society.
American Vacuum Society.
Japan Society of Applied Physics.
Publication, Distribution, etc.: Northern California Chapter, American Vacuum Society
Publication Date: 1997.
Publication Date (W3CDTF): 1997
Extent: v.
Alternative Title: Also known as P2ID. IEEE cat no 97TH8265
plasma process induced damage ; P2ID ; IEEE ; JSAP
NDLC: M17
ND
Note (General): Extended abstracts.
Also known as P2ID. IEEE cat no 97TH8265.
Index term: plasma process induced damage ; P2ID ; IEEE ; JSAP.
BL shelfmark: 4550.30255 2nd 1997.
Holding library: 国立国会図書館
Call No.: M17-98-0359
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000003504845
http://id.ndl.go.jp/bib/000003504845
UKMARC No.: G05383846
Bibliographic Record Category (NDL): 215