Simulation of semiconductor processes and devices : International conference : Sep 1996, Tokyo, Japan.

• Material Type: 図書
• ISBN: 0780327454 (pbk); 0780327462 (microfiche)
• Title: Simulation of semiconductor processes and devices : International conference : Sep 1996, Tokyo, Japan.
• Author Heading: Japan Society of Applied Physics.; Institute of Electrical and Electronics Engineers. Electron Devices Society (EDS)
• Publication, Distribution, etc.: Japan Society of Applied Physics
• Publication Date: 1996.
• Publication Date (W3CDTF): 1996
• Extent: v.
• Alternative Title: Also known as SISPAD '96. This SISPAD is the first unified conference from 3 precedent conferences: International workshop on numerical modeling of processes and devices for integrated circuits (NUPAD), International conference on simulation of semiconductor devices and processes (SISDEP) and International workshop on VLSI process and device modeling (VPAD). IEEE cat no 96TH8095; simulation ; semiconductor processes ; JSAP ; SISPAD ; IEEE
• NDLC: M17; ND
• Note (General): Short papers and programme.; Also known as SISPAD '96. This SISPAD is the first unified conference from 3 precedent conferences: International workshop on numerical modeling of processes and devices for integrated circuits (NUPAD) , International conference on simulation of semiconductor devices and processes (SISDEP) and International workshop on VLSI process and device modeling (VPAD) . IEEE cat no 96TH8095.; Index term: simulation ; semiconductor processes ; JSAP ; SISPAD ; IEEE.; BL shelfmark: 4538.8813 1996.
• Holding library: 国立国会図書館
• Call No.: M17-98-0402
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 000003504888; http://id.ndl.go.jp/bib/000003504888
• UKMARC No.: G05335475
• Bibliographic Record Category (NDL): 215