図書

Interconnect and contact metallization : Symposium on thin film materials, processes, reliability, and applications-interconnect and contact metallization: materials, processes, and reliability : Aug 1997, Paris, France. (PV ; 97-31)

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Interconnect and contact metallization : Symposium on thin film materials, processes, reliability, and applications-interconnect and contact metallization: materials, processes, and reliability : Aug 1997, Paris, France.

(PV ; 97-31)

Call No. (NDL)
M17-98-1742
Bibliographic ID of National Diet Library
000003506651
Material type
図書
Author
Electrochemical Society. Dielectric Science and Technology Division.ほか
Publisher
Electrochemical Society
Publication date
1998.
Material Format
Paper
Capacity, size, etc.
v.
NDC
-
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Notes on use

Note (General)：

Papers.Held during the Fall meeting of the Electrochemical Society.Index term: thin film materials ; interconnect metallization ; electrochemical ; co...

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Paper

Material Type
図書
ISBN
1566771846
Title
Interconnect and contact metallization : Symposium on thin film materials, processes, reliability, and applications-interconnect and contact metallization: materials, processes, and reliability : Aug 1997, Paris, France.
Series Title
PV ; 97-31
Author Heading
Electrochemical Society. Dielectric Science and Technology Division.
Electrochemical Society. Electronics Division.
Electrochemical Society. Electrodeposition Division.
Publication, Distribution, etc.
Electrochemical Society
Publication Date
1998.
Publication Date (W3CDTF)
1998
Extent
v.
Alternative Title
Held during the Fall meeting of the Electrochemical Society
thin film materials ; interconnect metallization ; electrochemical ; contact metallization