Photomask and X-ray mask technology 6 : 6th International symposium : Apr 1999, Yokohama, Japan. (SPIE Proceedings ; 3748)

Photomask and X-ray mask technology 6 : 6th International symposium : Apr 1999, Yokohama, Japan.

(SPIE Proceedings ; 3748)

Notes on use

Note (General)：: Selected papers.Also known as Photomask Japan '99.Index term: photomask technology ; X ray mask technology ; SPIE.

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Material Type: 図書
ISBN: 081943230X
ISSN: 0277-786X
Title: Photomask and X-ray mask technology 6 : 6th International symposium : Apr 1999, Yokohama, Japan.
Series Title: SPIE Proceedings ; 3748
Author Heading: BACUS.
Photomask Japan.
SPIE-The International Society for Optical Engineering.
Extent: v.
Alternative Title: Also known as Photomask Japan '99
photomask technology ; X ray mask technology ; SPIE
NDLC: M17
ND
Note (General): Selected papers.
Also known as Photomask Japan '99.
Index term: photomask technology ; X ray mask technology ; SPIE.
Holding library: 国立国会図書館
Call No.: M17-00-0045
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000003509826
http://id.ndl.go.jp/bib/000003509826
Bibliographic Record Category (NDL): 215