A study on light scattering characteristics of CMP-induced defects on silicon oxide wafer surface for defects detection and classification

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Material Type: 博士論文
Title: A study on light scattering characteristics of CMP-induced defects on silicon oxide wafer surface for defects detection and classification
Author/Editor: Taeho Ha [著]
Author Heading: 河, 兌[ホ] ハ, テホ
Publication, Distribution, etc.: [Taeho Ha]
Publication Date: 2002
Publication Date (W3CDTF): 2002
Extent: 1冊
Alternative Title: CMP加工表面薄膜欠陥の光散乱現象の解析とその評価 CMP カコウヒョウメンハクマクケッカンノヒカリサンランゲンショウノカイセキトソノヒョウカ
Degree grantor/type: 大阪大学
Date Granted: 平成15年3月25日
Date Granted (W3CDTF): 2003
Dissertation Number: 甲第9194号
Degree Type: 博士 (工学)
Note (Dissertation): 博士論文
Place of Publication (Country Code): JP
Text Language Code: eng
Alias of Author: Ha, Taeho
NDLC: UT51
Note (General): 博士論文
Holding library: 国立国会図書館
Call No.: UT51-2003-E647
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000004137406
http://id.ndl.go.jp/bib/000004137406
Bibliographic Record Category (NDL): 213