Metrology, inspection, and process control for microlithography 16 : 4-7 March 2002 : Santa Clara, USA. : Mar 2002, Santa Clara, CA. (SPIE Proceedings ; 4689)

Metrology, inspection, and process control for microlithography 16 : 4-7 March 2002 : Santa Clara, USA. : Mar 2002, Santa Clara, CA.

(SPIE Proceedings ; 4689)

Call No. (NDL): M17-03-4211
Bibliographic ID of National Diet Library: 000004204077

Material type: 図書

Author: Semiconductor Equipment and Materials International (SEMI)ほか

Publisher: SPIE

Publication date: c2002.

Material Format: Paper

Capacity, size, etc.: 2 v. : ill. (some col.) ; 28 cm.

NDC: -

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Note (General)：: Papers.

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Paper

Material Type: 図書
ISBN: 0819444359
ISSN (series): 0277-786X
Title: Metrology, inspection, and process control for microlithography 16 : 4-7 March 2002 : Santa Clara, USA. : Mar 2002, Santa Clara, CA.
Series Title: SPIE Proceedings ; 4689
Title Heading: Proceedings of SPIE -- the International Society for Optical Engineering ; v. 4689.
Author Heading: Semiconductor Equipment and Materials International (SEMI)
Herr, Daniel J. C.
International SEMATECH.
Publication, Distribution, etc.: Bellingham : SPIE
Publication Date: c2002.
Publication Date (W3CDTF): 2002
Extent: 2 v. : ill. (some col.) ; 28 cm.
Place of Publication (Country Code): US
Text Language Code: eng
Subject Heading: Integrated circuits -- Inspection -- Congresses.
Integrated circuits -- Measurement -- Congresses.
Microlithography -- Congresses.
Process control -- Congresses.
NDLC: M17
Note (General): Papers.
Note (Bibliography): Includes bibliographical references and author index.
Holding library: 国立国会図書館
Call No.: M17-03-4211
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000004204077
http://id.ndl.go.jp/bib/000004204077
RLIN No.: GAEGO50505072-B
Bibliographic Record Category (NDL): 215