Modeling of chemical mechanical polishing for shallow trench isolation

Capacity, size, etc.: 3 microfiches (205 fr.) : negative, ill. ; 11 x 15 cm.

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Material Type: 博士論文
Title: Modeling of chemical mechanical polishing for shallow trench isolation
Author/Editor: Brian Lee.
Author Heading: Lee, Brian.
Publication, Distribution, etc.: Cambridge : Massachusetts Institute of Technology
Publication Date: 2002.
Extent: 3 microfiches (205 fr.) : negative, ill. ; 11 x 15 cm.
Degree grantor/type: Massachusetts Institute of Technology
Date Granted: 2002.
Date Granted (W3CDTF): 2002
Note (Dissertation): 博士論文
Thesis (doctoral) --Massachusetts Institute of Technology, 2002.
Place of Publication (Country Code): US
Text Language Code: eng
Note (Material Type): [microform]
Note (Bibliography): Includes bibliographies.
Holding library: 国立国会図書館
Call No.: LS-DIMIT-02-112
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000004358240
http://id.ndl.go.jp/bib/000004358240
Bibliographic Record Category (NDL): 216