Effect of Argon and Hydrogen on Deposition of Silicon from Tetrachlorosilane in Cold Plasmas NASA-TM-87219 N86-17472 NAS-11587219 E-2820

Effect of Argon and Hydrogen on Deposition of Silicon from Tetrachlorosilane in Cold Plasmas

NASA-TM-87219 N86-17472 NAS-11587219 E-2820

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Material Type: 規格・テクニカルリポート類
Title: Effect of Argon and Hydrogen on Deposition of Silicon from Tetrachlorosilane in Cold Plasmas
Author/Editor: Manory, R. R
Avni, R
Grill, A
Extent: microfiche 16 p
Note (Material Type): [microform]
Report No.: テクニカルリポート番号 : NASA-TM-87219
テクニカルリポート番号 : N86-17472
テクニカルリポート番号 : NAS-11587219
テクニカルリポート番号 : E-2820
Holding library: 国立国会図書館
Call No.: LS-N86/17472
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000004982374
http://id.ndl.go.jp/bib/000004982374
Bibliographic Record Category (NDL): 291