Oxide formation on NbAl(sub 3) and TiAl due to ion implantation of (sup 18)O CONF-931108-106 DE94 017874

Oxide formation on NbAl(sub 3) and TiAl due to ion implantation of (sup 18)O

CONF-931108-106 DE94 017874

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Material Type: 規格・テクニカルリポート類
Title: Oxide formation on NbAl(sub 3) and TiAl due to ion implantation of (sup 18)O
Author/Editor: Hanrahan, R. J
Verink, E. D
Withrow, S. P
Ristolainen, E. O
Publication Date: 1993
Publication Date (W3CDTF): 1993
Extent: 6 p. (1 microfiche)
Note (Material Type): [microform]
Report No.: テクニカルリポート番号 : CONF-931108-106
テクニカルリポート番号 : DE94 017874
Holding library: 国立国会図書館
Call No.: LS-DE94/017874
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000005503853
http://id.ndl.go.jp/bib/000005503853
Bibliographic Record Category (NDL): 291