Versatile masking process for plasma etched backside via holes in GaAs SAND-94-2200C DE94 019176 CONF-94111322

Versatile masking process for plasma etched backside via holes in GaAs

SAND-94-2200C DE94 019176 CONF-94111322

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Material Type: 規格・テクニカルリポート類
Title: Versatile masking process for plasma etched backside via holes in GaAs
Author/Editor: Howard, A. J
Shul, R. J
Lovejoy, M. L
Word, J. C
Publication Date: 1994
Publication Date (W3CDTF): 1994
Extent: 6 p. (1 microfiche)
Note (Material Type): [microform]
Report No.: テクニカルリポート番号 : SAND-94-2200C
テクニカルリポート番号 : DE94 019176
テクニカルリポート番号 : CONF-94111322
Holding library: 国立国会図書館
Call No.: LS-DE94/019176
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000005508309
http://id.ndl.go.jp/bib/000005508309
Bibliographic Record Category (NDL): 291