Increasing the retained dose by plasma immersion ion implantation and deposition LBL-35679 DE95 003423 CONF-9407313

Increasing the retained dose by plasma immersion ion implantation and deposition

LBL-35679 DE95 003423 CONF-9407313

You can check the details of this material, its authority (keywords that refer to materials on the same subject, author's name, etc.), etc.

Material Type: 規格・テクニカルリポート類
Title: Increasing the retained dose by plasma immersion ion implantation and deposition
Author/Editor: Anders, A
Anders, S
Brown, I. G
Yu, K. M
Publication Date: 1994
Publication Date (W3CDTF): 1994
Extent: 13 p. (1 microfiche)
Note (Material Type): [microform]
Report No.: テクニカルリポート番号 : LBL-35679
テクニカルリポート番号 : DE95 003423
テクニカルリポート番号 : CONF-9407313
Holding library: 国立国会図書館
Call No.: LS-DE95/003423
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000005510894
http://id.ndl.go.jp/bib/000005510894
Bibliographic Record Category (NDL): 291