Development of a polysilicon process bases on chemical vapor deposition DOE/JPL/955533-80-4 DOE/JPL/955533-79/1

Development of a polysilicon process bases on chemical vapor deposition

DOE/JPL/955533-80-4 DOE/JPL/955533-79/1

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Material Type: 規格・テクニカルリポート類
Title: Development of a polysilicon process bases on chemical vapor deposition
Author/Editor: Sharp, K
Publication Date: 1980
Publication Date (W3CDTF): 1980
Extent: 52 p. (1 microfiche)
Note (Material Type): [microform]
Report No.: テクニカルリポート番号 : DOE/JPL/955533-80-4
テクニカルリポート番号 : DOE/JPL/955533-79/1
Holding library: 国立国会図書館
Call No.: LS-DOE/JPL/955533-80-4
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000005516561
http://id.ndl.go.jp/bib/000005516561
Bibliographic Record Category (NDL): 291