Plasma source ion implantation of ammonia into electroplated chromium LA-UR-95-341 DE95 006275 CONF-9502014

Plasma source ion implantation of ammonia into electroplated chromium

LA-UR-95-341 DE95 006275 CONF-9502014

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Material Type: 規格・テクニカルリポート類
Title: Plasma source ion implantation of ammonia into electroplated chromium
Author/Editor: Scheuer, J. T
Walter, K. C
Rej, D. J
Nastasi, M
Blanchard, J. P
Publication Date: 1995
Publication Date (W3CDTF): 1995
Extent: 7 p. (1 microfiche)
Note (Material Type): [microform]
Report No.: テクニカルリポート番号 : LA-UR-95-341
テクニカルリポート番号 : DE95 006275
テクニカルリポート番号 : CONF-9502014
Holding library: 国立国会図書館
Call No.: LS-DE95/006275
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000005518030
http://id.ndl.go.jp/bib/000005518030
Bibliographic Record Category (NDL): 291