Amorphization threshold in Si-implanted strained SiGe alloy layers CONF-941144-105 DE95 008901

Amorphization threshold in Si-implanted strained SiGe alloy layers

CONF-941144-105 DE95 008901

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Material Type: 規格・テクニカルリポート類
Title: Amorphization threshold in Si-implanted strained SiGe alloy layers
Author/Editor: Simpson, T. W
Love, D
Endisch, E
Goldberg, R. D
Mitchell, I. V
Publication Date: 1994
Publication Date (W3CDTF): 1994
Extent: 7 p. (1 microfiche)
Note (Material Type): [microform]
Report No.: テクニカルリポート番号 : CONF-941144-105
テクニカルリポート番号 : DE95 008901
Holding library: 国立国会図書館
Call No.: LS-DE95/008901
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000005518200
http://id.ndl.go.jp/bib/000005518200
Bibliographic Record Category (NDL): 291