In situ x-ray diffraction study of CoSi2 formation during annealing of a Co/Ti bilayer on Si*(100) ANL/MSD/PP-84782 DE95 012213

In situ x-ray diffraction study of CoSi2 formation during annealing of a Co/Ti bilayer on Si*(100)

ANL/MSD/PP-84782 DE95 012213

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Material Type: 規格・テクニカルリポート類
Title: In situ x-ray diffraction study of CoSi2 formation during annealing of a Co/Ti bilayer on Si*(100)
Author/Editor: Selinder, T. I
Roberts, T. A
Miller, D. J
Beno, M. A
Knapp, G. S
Publication Date: 1995
Publication Date (W3CDTF): 1995
Extent: 15 p. (1 microfiche)
Note (Material Type): [microform]
Report No.: テクニカルリポート番号 : ANL/MSD/PP-84782
テクニカルリポート番号 : DE95 012213
Holding library: 国立国会図書館
Call No.: LS-DE95/012213
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000005523049
http://id.ndl.go.jp/bib/000005523049
Bibliographic Record Category (NDL): 291