Advanced source studies on laser produced plasmas for EUV lithography UCRL-JC-119627 DE95 014677 CONF-940917715

Advanced source studies on laser produced plasmas for EUV lithography

UCRL-JC-119627 DE95 014677 CONF-940917715

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Material Type: 規格・テクニカルリポート類
Title: Advanced source studies on laser produced plasmas for EUV lithography
Author/Editor: Spitzer, R. C
Gaines, D. P
Publication Date: 1995
Publication Date (W3CDTF): 1995
Extent: 8 p. (1 microfiche)
Note (Material Type): [microform]
Report No.: テクニカルリポート番号 : UCRL-JC-119627
テクニカルリポート番号 : DE95 014677
テクニカルリポート番号 : CONF-940917715
Holding library: 国立国会図書館
Call No.: LS-DE95/014677
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000005536340
http://id.ndl.go.jp/bib/000005536340
Bibliographic Record Category (NDL): 291