Thermal metalorganic chemical vapor deposition of Ti-Si-N films for diffusion barrier applications SAND-96-0919C DE96 009176 CONF-9604014

Thermal metalorganic chemical vapor deposition of Ti-Si-N films for diffusion barrier applications

SAND-96-0919C DE96 009176 CONF-9604014

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Material Type: 規格・テクニカルリポート類
Title: Thermal metalorganic chemical vapor deposition of Ti-Si-N films for diffusion barrier applications
Author/Editor: Custer, J. S
Smith, P. M
Jones, R. V
Maverick, A. W
Roberts, D. A
Publication Date: 1996
Publication Date (W3CDTF): 1996
Extent: 6 p. (1 microfiche)
Note (Material Type): [microform]
Report No.: テクニカルリポート番号 : SAND-96-0919C
テクニカルリポート番号 : DE96 009176
テクニカルリポート番号 : CONF-9604014
Holding library: 国立国会図書館
Call No.: LS-DE96/009176
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000005775901
http://id.ndl.go.jp/bib/000005775901
Bibliographic Record Category (NDL): 291