ECR, ICP, and RIE plasma etching of GaN SAND-96-1139C DE96 010562 CONF-96050213

ECR, ICP, and RIE plasma etching of GaN

SAND-96-1139C DE96 010562 CONF-96050213

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Material Type: 規格・テクニカルリポート類
Title: ECR, ICP, and RIE plasma etching of GaN
Author/Editor: Shul, R. J
McClellan, G. B
Rieger, D. J
Hafich, M. J
Publication Date: 1996
Publication Date (W3CDTF): 1996
Extent: 9 p. (1 microfiche)
Note (Material Type): [microform]
Report No.: テクニカルリポート番号 : SAND-96-1139C
テクニカルリポート番号 : DE96 010562
テクニカルリポート番号 : CONF-96050213
Holding library: 国立国会図書館
Call No.: LS-DE96/010562
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000005855468
http://id.ndl.go.jp/bib/000005855468
Bibliographic Record Category (NDL): 291