Results from modeling and simulation of chemical downstream etch systems SAND-96-8241 DE96 011072

Results from modeling and simulation of chemical downstream etch systems

SAND-96-8241 DE96 011072

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Material Type: 規格・テクニカルリポート類
Title: Results from modeling and simulation of chemical downstream etch systems
Author/Editor: Meeks, E
Vosen, S. R
Shon, J. W
Larson, R. S
Fox, C. A
Publication Date: 1996
Publication Date (W3CDTF): 1996
Extent: 75 p. (1 microfiche)
Note (Material Type): [microform]
Report No.: テクニカルリポート番号 : SAND-96-8241
テクニカルリポート番号 : DE96 011072
Holding library: 国立国会図書館
Call No.: LS-DE96/011072
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000005855474
http://id.ndl.go.jp/bib/000005855474
Bibliographic Record Category (NDL): 291