Commercial plasma source ion implantation facility LA-UR-96-3098 DE96 014933 CONF-96092691

Commercial plasma source ion implantation facility

LA-UR-96-3098 DE96 014933 CONF-96092691

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Material Type: 規格・テクニカルリポート類
Title: Commercial plasma source ion implantation facility
Author/Editor: Scheuer, J. T
Adler, R. A
Horne, W. G
Publication Date: 1996
Publication Date (W3CDTF): 1996
Extent: 10 p. (1 microfiche)
Note (Material Type): [microform]
Report No.: テクニカルリポート番号 : LA-UR-96-3098
テクニカルリポート番号 : DE96 014933
テクニカルリポート番号 : CONF-96092691
Holding library: 国立国会図書館
Call No.: LS-DE96/014933
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000005859542
http://id.ndl.go.jp/bib/000005859542
Bibliographic Record Category (NDL): 291