Voltage uniformity study in large-area reactors for RF plasma deposition LRP-554/96 DE97 718834

Voltage uniformity study in large-area reactors for RF plasma deposition

LRP-554/96 DE97 718834

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Material Type: 規格・テクニカルリポート類
Title: Voltage uniformity study in large-area reactors for RF plasma deposition
Author/Editor: Sansonnens, L
Pletzer, A
Magni, D
Howling, A. A
Hollenstein, C
Publication Date: 1996
Publication Date (W3CDTF): 1996
Extent: 27 p. (1 microfiche)
Note (Material Type): [microform]
Report No.: テクニカルリポート番号 : LRP-554/96
テクニカルリポート番号 : DE97 718834
Holding library: 国立国会図書館
Call No.: LS-DE97/718834
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000005863754
http://id.ndl.go.jp/bib/000005863754
Bibliographic Record Category (NDL): 291