Beamline and exposure station for deep x-ray lithography at the Advanced Photon Source ANL/XFD/CP-89571 DE97 000689 CONF-9610868

Beamline and exposure station for deep x-ray lithography at the Advanced Photon Source

ANL/XFD/CP-89571 DE97 000689 CONF-9610868

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Material Type: 規格・テクニカルリポート類
Title: Beamline and exposure station for deep x-ray lithography at the Advanced Photon Source
Author/Editor: Lai, B
Mancini, D. C
Yun, W
Gluskin, E
Publication Date: 1996
Publication Date (W3CDTF): 1996
Extent: 9 p. (1 microfiche)
Note (Material Type): [microform]
Report No.: テクニカルリポート番号 : ANL/XFD/CP-89571
テクニカルリポート番号 : DE97 000689
テクニカルリポート番号 : CONF-9610868
Holding library: 国立国会図書館
Call No.: LS-DE97/000689
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000005868501
http://id.ndl.go.jp/bib/000005868501
Bibliographic Record Category (NDL): 291