Effects of ion implantation and temperature on radiation-induced segregation in Ni-9Al alloys ANL/MSD/CP-90421 DE97 003163 CONF-96120281

Effects of ion implantation and temperature on radiation-induced segregation in Ni-9Al alloys

ANL/MSD/CP-90421 DE97 003163 CONF-96120281

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Material Type: 規格・テクニカルリポート類
Title: Effects of ion implantation and temperature on radiation-induced segregation in Ni-9Al alloys
Author/Editor: Giacobbe, M. J
Lam, N. Q
Okamoto, P. R
Zaluzec, N. J
Stubbins, J. F
Publication Date: 1996
Publication Date (W3CDTF): 1996
Extent: 6 p. (1 microfiche)
Note (Material Type): [microform]
Report No.: テクニカルリポート番号 : ANL/MSD/CP-90421
テクニカルリポート番号 : DE97 003163
テクニカルリポート番号 : CONF-96120281
Holding library: 国立国会図書館
Call No.: LS-DE97/003163
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000005868602
http://id.ndl.go.jp/bib/000005868602
Bibliographic Record Category (NDL): 291