Resonance ionization of sputtered atoms: quantitative analysis in the near-surface region of silicon wafers ANL/CHM/CP-90671 DE97 003899 CONF-96111027

Resonance ionization of sputtered atoms: quantitative analysis in the near-surface region of silicon wafers

ANL/CHM/CP-90671 DE97 003899 CONF-96111027

Call No. (NDL): LS-DE97/003899
Bibliographic ID of National Diet Library: 000005869158

Material type: 規格・テクニカルリポート類

Author: Calaway, W. Fほか

Publisher: -

Publication date: 1996

Material Format: Microform

Capacity, size, etc.: 7 p. (1 microfiche)

NDC: -

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Microform

Material Type: 規格・テクニカルリポート類
Title: Resonance ionization of sputtered atoms: quantitative analysis in the near-surface region of silicon wafers
Author/Editor: Calaway, W. F
Pellin, M. J
Spiegel, D. R
Marshall, A. H
Downey, S. W
Publication Date: 1996
Publication Date (W3CDTF): 1996
Extent: 7 p. (1 microfiche)
Note (Material Type): [microform]
Report No.: テクニカルリポート番号 : ANL/CHM/CP-90671
テクニカルリポート番号 : DE97 003899
テクニカルリポート番号 : CONF-96111027
Holding library: 国立国会図書館
Call No.: LS-DE97/003899
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000005869158
http://id.ndl.go.jp/bib/000005869158
Bibliographic Record Category (NDL): 291