Cl(sub 2)-based dry etching of the AlGaInN system in inductively coupled plasmas SAND-98-0224C DE98 002589

Cl(sub 2)-based dry etching of the AlGaInN system in inductively coupled plasmas

SAND-98-0224C DE98 002589

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Material Type: 規格・テクニカルリポート類
Title: Cl(sub 2)-based dry etching of the AlGaInN system in inductively coupled plasmas
Author/Editor: Cho, H
Vartuli, C. B
Abernathy, C. R
Conovan, S. M
Pearton, S. J
Publication Date: 1997
Publication Date (W3CDTF): 1997
Extent: 8 p. (1 microfiche)
Note (Material Type): [microform]
Report No.: テクニカルリポート番号 : SAND-98-0224C
テクニカルリポート番号 : DE98 002589
Holding library: 国立国会図書館
Call No.: LS-DE98/002589
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000005880743
http://id.ndl.go.jp/bib/000005880743
Bibliographic Record Category (NDL): 291