Index of refraction versus oxygen partial pressure for tantalum oxide and silicon dioxide films produced by ion beam deposition UCRLJC128666 DE98 056042

Index of refraction versus oxygen partial pressure for tantalum oxide and silicon dioxide films produced by ion beam deposition

UCRLJC128666 DE98 056042

Call No. (NDL): LS-DE98/056042
Bibliographic ID of National Diet Library: 000005946018

Material type: 規格・テクニカルリポート類

Author: Goward, W. Dほか

Publisher: -

Publication date: 1998

Material Format: Microform

Capacity, size, etc.: 7 p. (1 microfiche)

NDC: -

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Microform

Material Type: 規格・テクニカルリポート類
Title: Index of refraction versus oxygen partial pressure for tantalum oxide and silicon dioxide films produced by ion beam deposition
Author/Editor: Goward, W. D
Petersen, H. E
Dijaili, S. P
Walker, J. D
Publication Date: 1998
Publication Date (W3CDTF): 1998
Extent: 7 p. (1 microfiche)
Note (Material Type): [microform]
Report No.: テクニカルリポート番号 : UCRLJC128666
テクニカルリポート番号 : DE98 056042
Holding library: 国立国会図書館
Call No.: LS-DE98/056042
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000005946018
http://id.ndl.go.jp/bib/000005946018
Bibliographic Record Category (NDL): 291