Molecular dynamics simulations and thermochemistry of reactive ion etching of silicon by chlorine, chlorine dimer, bromine, and bromine dimer cations LAUR982183 DE99 000765

Molecular dynamics simulations and thermochemistry of reactive ion etching of silicon by chlorine, chlorine dimer, bromine, and bromine dimer cations

LAUR982183 DE99 000765

Call No. (NDL): LS-DE99/000765
Bibliographic ID of National Diet Library: 000005966716

Material type: 規格・テクニカルリポート類

Author: Valone, S. Mほか

Publisher: -

Publication date: 1998

Material Format: Microform

Capacity, size, etc.: 7 p. (1 microfiche)

NDC: -

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Microform

Material Type: 規格・テクニカルリポート類
Title: Molecular dynamics simulations and thermochemistry of reactive ion etching of silicon by chlorine, chlorine dimer, bromine, and bromine dimer cations
Author/Editor: Valone, S. M
Hanson, D. E
Kress, J. D
Publication Date: 1998
Publication Date (W3CDTF): 1998
Extent: 7 p. (1 microfiche)
Note (Material Type): [microform]
Report No.: テクニカルリポート番号 : LAUR982183
テクニカルリポート番号 : DE99 000765
Holding library: 国立国会図書館
Call No.: LS-DE99/000765
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000005966716
http://id.ndl.go.jp/bib/000005966716
Bibliographic Record Category (NDL): 291