Patentgesetz und Gebrauchsmustergesetz; systematischer kommentar. [Begründet von Eduard Reimer]. 3., erw. Aufl., neu bearb. von Karl Nastelski [et al.]

Patentgesetz und Gebrauchsmustergesetz; systematischer kommentar. [Begründet von Eduard Reimer].

3., erw. Aufl., neu bearb. von Karl Nastelski [et al.]

Call No. (NDL): CG4-463-5
Bibliographic ID of National Diet Library: 000006296332

Material type: 図書

Author: Nastelski, Karl.ほか

Publisher: C. Heymann

Publication date: 1968.

Material Format: Paper

Capacity, size, etc.: xxx, 2505 p. 24 cm.

NDC: -

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Notes on use

Note (General)：: First-2d ed. entered under Germany (Federal Republic, 1949- ) Laws, statutes, etc.

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Paper

Material Type: 図書
Title: Patentgesetz und Gebrauchsmustergesetz; systematischer kommentar. [Begründet von Eduard Reimer].
Edition: 3., erw. Aufl., neu bearb. von Karl Nastelski [et al.]
Title Heading: Germany (Federal Republic, 1949- ) . Laws, statutes, etc. Patentgesetz.
Germany (Federal Republic, 1949- ) . Laws, statutes, etc. Gebrauchsmustergesetz.
Author Heading: Nastelski, Karl.
Reimer, Eduard.
Publication, Distribution, etc.: Köln : C. Heymann
Publication Date: 1968.
Publication Date (W3CDTF): 1968
Extent: xxx, 2505 p. 24 cm.
Place of Publication (Country Code): DE
Text Language Code: ger
Subject Heading: Patent laws and legislation -- Germany (West)
Models (Patents) -- Germany (West)
NDLC: CG4-463
AG4-163
Note (General): First-2d ed. entered under Germany (Federal Republic, 1949- ) Laws, statutes, etc.
Note (Bibliography): Bibliography : p. [xiii]-xix.
Holding library: 国立国会図書館
Call No.: CG4-463-5
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000006296332
http://id.ndl.go.jp/bib/000006296332
LC Control Number: 77366667
https://lccn.loc.gov/77366667
Bibliographic Record Category (NDL): 211