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Physics and technology of high-k gate dielectrics 2 : proceedings of the second international symposium on high dielectric constant materials: materials science, processing, reliability, and manufacturing issues : held in Orlando, Florida, October 12-16, 2003. : Oct 2003, Orlando, FL. (PV ; 2003-22)

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Physics and technology of high-k gate dielectrics 2 : proceedings of the second international symposium on high dielectric constant materials: materials science, processing, reliability, and manufacturing issues : held in Orlando, Florida, October 12-16, 2003. : Oct 2003, Orlando, FL.

(PV ; 2003-22)

Call No. (NDL)
M17-04-2359
Bibliographic ID of National Diet Library
000007377733
Material type
図書
Author
Kar, S.ほか
Publisher
Electrochemical Society
Publication date
c2004.
Material Format
Paper
Capacity, size, etc.
xvii, 490 p. : ill. ; 24 cm.
NDC
-
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Note (General):

Selected papers."This symposium (...) was held during its 204th Meeting." -- p. v.

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Paper

Material Type
図書
ISBN
1566774055
Series Title
Publication, Distribution, etc.
Publication Date
c2004.
Publication Date (W3CDTF)
2004
Extent
xvii, 490 p. : ill. ; 24 cm.