Data analysis and modeling for process control : 26-27 February 2004 : Santa Clara, California, USA. : Feb 2004, Santa Clara, CA. (SPIE Proceedings ; 5378)

Data analysis and modeling for process control : 26-27 February 2004 : Santa Clara, California, USA. : Feb 2004, Santa Clara, CA.

(SPIE Proceedings ; 5378)

Call No. (NDL): M17-04-2627
Bibliographic ID of National Diet Library: 000007404221

Material type: 図書

Author: Semiconductor Equipment and Materials International (SEMI)ほか

Publisher: SPIE

Publication date: c2004.

Material Format: Paper

Capacity, size, etc.: xxx, 248 p. : ill. ; 28 cm.

NDC: -

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Note (General)：: Papers.

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Paper

Material Type: 図書
ISBN: 0819452912
ISSN (series): 0277-786X
Title: Data analysis and modeling for process control : 26-27 February 2004 : Santa Clara, California, USA. : Feb 2004, Santa Clara, CA.
Series Title: SPIE Proceedings ; 5378
Title Heading: Proceedings of SPIE -- the International Society for Optical Engineering ; v. 5378.
Author Heading: Semiconductor Equipment and Materials International (SEMI)
Tobin, Kenneth W.
International SEMATECH.
Publication, Distribution, etc.: Bellingham : SPIE
Publication Date: c2004.
Publication Date (W3CDTF): 2004
Extent: xxx, 248 p. : ill. ; 28 cm.
Place of Publication (Country Code): US
Text Language Code: eng
Subject Heading: Manufacturing processes -- Mathematical models -- Congresses.
Manufacturing processes -- Automatic control -- Congresses.
Intelligent control systems -- Mathematical models -- Congresses.
Process control -- Mathematical models -- Congresses.
NDLC: M17
Note (General): Papers.
Note (Bibliography): Includes bibliographical references and author index.
Holding library: 国立国会図書館
Call No.: M17-04-2627
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000007404221
http://id.ndl.go.jp/bib/000007404221
RLIN No.: CSUGA5645586-B
Bibliographic Record Category (NDL): 215