Design and process integration for microelectronic manufacturing 2 : 26-27 February 2004 : Santa Clara, California, USA. : Feb 2004, Santa Clara, CA.

• Material Type: 図書
• ISBN: 0819452920
• ISSN (series): 0277-786X
• Title: Design and process integration for microelectronic manufacturing 2 : 26-27 February 2004 : Santa Clara, California, USA. : Feb 2004, Santa Clara, CA.
• Series Title: SPIE Proceedings ; 5379
• Title Heading: Proceedings of SPIE -- the International Society for Optical Engineering ; v. 5379.
• Author Heading: Semiconductor Equipment and Materials International (SEMI); Liebmann, Lars W.; International SEMATECH.
• Publication, Distribution, etc.: Bellingham : SPIE
• Publication Date: c2004.
• Publication Date (W3CDTF): 2004
• Extent: xxviii, 302 p. : ill., ports. ; 28 cm.
• Place of Publication (Country Code): US
• Text Language Code: eng
• Subject Heading: Integrated circuits -- Design and construction -- Congresses.; Integrated circuits -- Defects -- Analysis -- Congresses.; Semiconductors -- Design and construction -- Congresses.; Semiconductor wafers -- Defects -- Analysis -- Congresses.; Microelectronics industry -- Quality control -- Congresses.; Quality control -- Congresses.
• NDLC: M17
• Note (General): Papers.
• Note (Bibliography): Includes bibliographical references and author index.
• Holding library: 国立国会図書館
• Call No.: M17-04-2629
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 000007404227; http://id.ndl.go.jp/bib/000007404227
• RLIN No.: CSUGA5645595-B
• Bibliographic Record Category (NDL): 215