Optical microlithography 17 : 24-27 February 2004 : Santa Clara, California, USA. : Feb 2004, Santa Clara, CA. (SPIE Proceedings ; 5377)

Optical microlithography 17 : 24-27 February 2004 : Santa Clara, California, USA. : Feb 2004, Santa Clara, CA.

(SPIE Proceedings ; 5377)

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Material Type: 図書
ISBN (set): 0819452904 (set)
ISSN (series): 0277-786X
Title: Optical microlithography 17 : 24-27 February 2004 : Santa Clara, California, USA. : Feb 2004, Santa Clara, CA.
Series Title: SPIE Proceedings ; 5377
Title Heading: Proceedings of SPIE -- the International Society for Optical Engineering. v. 5377.
Author Heading: Semiconductor Equipment and Materials International (SEMI)
Smith, Bruce W., 1959-
International SEMATECH.
Publication, Distribution, etc.: Bellingham : SPIE
Publication Date: c2004.
Publication Date (W3CDTF): 2004
Extent: 3 parts : ill. (some col.) ; 28 cm.
Place of Publication (Country Code): US
Text Language Code: eng
Subject Heading: Integrated circuits -- Masks -- Congresses.
Microlithography -- Congresses.
X-ray lithography -- Congresses.
Manufacturing processes -- Congresses.
NDLC: M17
Note (General): Papers.
Note (Bibliography): Includes bibliographic references and author index.
Holding library: 国立国会図書館
Call No.: M17-04-2909
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000007443463
http://id.ndl.go.jp/bib/000007443463
RLIN No.: MOHG55858298-B
Bibliographic Record Category (NDL): 215