Enhanced diffusion of silicon and boron in thermal oxides formed on silicon substrates

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Material Type: 博士論文
Title: Enhanced diffusion of silicon and boron in thermal oxides formed on silicon substrates
Author/Editor: Shigeto Fukatsu [著]
Author Heading: 深津, 茂人フカツ, シゲト
Publication, Distribution, etc.: [Shigeto Fukatsu]
Publication Date: 2004
Publication Date (W3CDTF): 2004
Extent: 1冊
Alternative Title: シリコン基板上の熱酸化膜中におけるシリコン及びボロンの増速拡散シリコンキバンジョウノネツサンカマクチュウニオケルシリコンオヨビボロンノゾウソクカクサン
Degree grantor/type: 慶應義塾大学
Date Granted: 平成17年3月23日
Date Granted (W3CDTF): 2005
Dissertation Number: 甲第2343号
Degree Type: 博士 (工学)
Note (Dissertation): 博士論文
Place of Publication (Country Code): JP
Text Language Code: eng
NDLC: UT51
Note (General): 博士論文
Holding library: 国立国会図書館
Call No.: UT51-2005-E36
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000007842010
http://id.ndl.go.jp/bib/000007842010
Bibliographic Record Category (NDL): 213