Electrical characterization of silicon oxynitride thin films grown by plasma nitridation and gate dielectric application in recessed channel MOSFETs

Call No. (NDL): UT51-2005-H370
Bibliographic ID of National Diet Library: 000007902747

Material type: 博士論文

Author: Loku Dombawalage Rohana Dharmapriya Perera [著]

Publisher: [Loku Dombawalage Rohana Dharmapriya Perera]

Publication date: [2005]

Material Format: Paper

Capacity, size, etc.: 1冊

Name of awarding university/degree: 九州大学,博士 (工学)

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Note (General)：: 博士論文

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Paper

Material Type: 博士論文
Title: Electrical characterization of silicon oxynitride thin films grown by plasma nitridation and gate dielectric application in recessed channel MOSFETs
Author/Editor: Loku Dombawalage Rohana Dharmapriya Perera [著]
Author Heading: Loku Dombawalage Rohana Dharmapriya Perera ロクドンバワラゲロハナダルマップリヤペレラ
Publication, Distribution, etc.: [Loku Dombawalage Rohana Dharmapriya Perera]
Publication Date: [2005]
Publication Date (W3CDTF): 2005
Extent: 1冊
Alternative Title: プラズマ窒化によるシリコン酸窒化薄膜の電気的特性評価と掘り込みチャンネルMOSFETゲート絶縁膜への応用プラズマチッカニヨルシリコンサンチッカハクマクノデンキテキトクセイヒョウカトホリコミチャンネル MOSFET ゲートゼツエンマクエノオウヨウ
Degree grantor/type: 九州大学
Date Granted: 平成17年3月25日
Date Granted (W3CDTF): 2005
Dissertation Number: 甲第7417号
Degree Type: 博士 (工学)
Note (Dissertation): 博士論文
Place of Publication (Country Code): JP
Text Language Code: eng
NDLC: UT51
Note (General): 博士論文
Holding library: 国立国会図書館
Call No.: UT51-2005-H370
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000007902747
http://id.ndl.go.jp/bib/000007902747
Bibliographic Record Category (NDL): 213