Technology and international stability : (SWIIS 2003) : a proceedings volume from the IFAC workshop, Waterford, Republic of Ireland, 3-5 July 2003. : Jul 2003, Waterford, Ireland. 1st ed. (IFAC Proceedings)

Technology and international stability : (SWIIS 2003) : a proceedings volume from the IFAC workshop, Waterford, Republic of Ireland, 3-5 July 2003. : Jul 2003, Waterford, Ireland.

1st ed.

(IFAC Proceedings)

Call No. (NDL): M17-06-335
Bibliographic ID of National Diet Library: 000008052543

Material type: 図書

Author: Information Systems and Organisational Learning Research Group (ISOL)ほか

Publisher: Elsevier

Publication date: 2004.

Material Format: Paper

Capacity, size, etc.: v, 97 p. : ill. ; 30 cm.

NDC: -

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Note (General)：: Papers.

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Paper

Material Type: 図書
ISBN: 0080442900
ISSN (series): 1474-6670
Title: Technology and international stability : (SWIIS 2003) : a proceedings volume from the IFAC workshop, Waterford, Republic of Ireland, 3-5 July 2003. : Jul 2003, Waterford, Ireland.
Edition: 1st ed.
Series Title: IFAC Proceedings
Author Heading: Information Systems and Organisational Learning Research Group (ISOL)
Kopacek, Peter.
Stapleton, Larry.
IFAC Workshop on Technology and International Stability (2003 : Waterford, Ireland)
Publication, Distribution, etc.: Oxford : Elsevier
Publication Date: 2004.
Publication Date (W3CDTF): 2004
Extent: v, 97 p. : ill. ; 30 cm.
Place of Publication (Country Code): GB
Text Language Code: eng
Subject Heading: Technology and international affairs -- Congresses.
Security, International -- Congresses.
Technological innovations -- Social aspects -- Congresses.
Technology transfer -- Congresses.
LCC: T49.5
DDC: 327.17
NDLC: M17
Note (General): Papers.
Note (Bibliography): Includes bibliographical references and author index.
Holding library: 国立国会図書館
Call No.: M17-06-335
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000008052543
http://id.ndl.go.jp/bib/000008052543
RLIN No.: NYCXV5140828-B
Bibliographic Record Category (NDL): 215