Photomask fabrication technology / Benjamin G. Eynon, Jr., Banqiu Wu. (McGraw-Hill electronic engineering)

Photomask fabrication technology / Benjamin G. Eynon, Jr., Banqiu Wu.

(McGraw-Hill electronic engineering)

Call No. (NDL): X
Bibliographic ID of National Diet Library: 000008156031

Material type: 図書

Author: Eynon, Benjamin G.ほか

Publisher: McGraw-Hill

Publication date: c2005.

Material Format: Paper

Capacity, size, etc.: xi, 571 p. : ill. ; 24 cm.

NDC: -

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Notes on use

Note (General)：: Related URL: Contributor biographical information http: //www.loc.gov/catdir/enhancements/fy0624/2005047886-b.html.Related URL: Publisher description ...

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Paper

Material Type: 図書
ISBN: 0071445633 (alk. paper)
Title: Photomask fabrication technology / Benjamin G. Eynon, Jr., Banqiu Wu.
Series Title: McGraw-Hill electronic engineering
Title Heading: McGraw-Hill electronic engineering series.
Author Heading: Eynon, Benjamin G.
Wu, Banqiu.
Publication, Distribution, etc.: New York : McGraw-Hill
Publication Date: c2005.
Publication Date (W3CDTF): 2005
Extent: xi, 571 p. : ill. ; 24 cm.
Place of Publication (Country Code): US
Text Language Code: eng
Subject Heading: Integrated circuits -- Masks.
Masks (Electronics)
Microlithography.
LCC: TK7872.M3
DDC: 621.3815/31
NDLC: ND351
Note (General): Related URL: Contributor biographical information http: //www.loc.gov/catdir/enhancements/fy0624/2005047886-b.html.
Related URL: Publisher description http: //www.loc.gov/catdir/enhancements/fy0624/2005047886-d.html.
Related URL: Table of contents http: //www.loc.gov/catdir/enhancements/fy0624/2005047886-t.html.
Note (Bibliography): Includes bibliographical references and index.
Holding library: 国立国会図書館
Call No.: X
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000008156031
http://id.ndl.go.jp/bib/000008156031
LC Control Number: 2005047886
https://lccn.loc.gov/2005047886
RLIN No.: DCLC2005047886-B
Cataloging Rule: Anglo-American Cataloging Rules
Bibliographic Record Category (NDL): 211