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図書

Photomask and next-generation lithography mask technology 13 : 18-20 April 2006 : Yokohama, Japan. : Apr 2006, Yokohama, Japan. (SPIE Proceedings ; 6283)

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Photomask and next-generation lithography mask technology 13 : 18-20 April 2006 : Yokohama, Japan. : Apr 2006, Yokohama, Japan.

(SPIE Proceedings ; 6283)

Call No. (NDL)
M17-06-2188
Bibliographic ID of National Diet Library
000008270253
Material type
図書
Author
Japan Society of Applied Physics.ほか
Publisher
SPIE
Publication date
c2006.
Material Format
Paper
Capacity, size, etc.
2 parts : ill. (some col.) ; 28 cm.
NDC
-
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Notes on use

Note (General)：

Papers."It was the thirteenth international symposium held in Japan." -- introd.

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Paper

Material Type
図書
ISBN (set)
0819463582 (set)
ISSN (series)
0277-786X
Title
Photomask and next-generation lithography mask technology 13 : 18-20 April 2006 : Yokohama, Japan. : Apr 2006, Yokohama, Japan.
Series Title
SPIE Proceedings ; 6283
Title Heading
Proceedings of SPIE -- the International Society for Optical Engineering ; v. 6283.
Author Heading
Japan Society of Applied Physics.
Hoga, Morihisa.
Publication, Distribution, etc.
Bellingham : SPIE
Publication Date
c2006.
Publication Date (W3CDTF)
2006