図書

Photomask and next-generation lithography mask technology 13 : 18-20 April 2006 : Yokohama, Japan. : Apr 2006, Yokohama, Japan. (SPIE Proceedings ; 6283)

Icons representing 図書

Photomask and next-generation lithography mask technology 13 : 18-20 April 2006 : Yokohama, Japan. : Apr 2006, Yokohama, Japan.

(SPIE Proceedings ; 6283)

Call No. (NDL)
M17-06-2188
Bibliographic ID of National Diet Library
000008270253
Material type
図書
Author
Japan Society of Applied Physics.ほか
Publisher
SPIE
Publication date
c2006.
Material Format
Paper
Capacity, size, etc.
2 parts : ill. (some col.) ; 28 cm.
NDC
-
View All

Notes on use

Note (General)：

Papers."It was the thirteenth international symposium held in Japan." -- introd.

Search by Bookstore

Search by Bookstore

Search by Bookstore

Bibliographic Record

You can check the details of this material, its authority (keywords that refer to materials on the same subject, author's name, etc.), etc.

Paper

Material Type
図書
ISBN (set)
0819463582 (set)
ISSN (series)
0277-786X
Title
Photomask and next-generation lithography mask technology 13 : 18-20 April 2006 : Yokohama, Japan. : Apr 2006, Yokohama, Japan.
Series Title
SPIE Proceedings ; 6283
Title Heading
Proceedings of SPIE -- the International Society for Optical Engineering ; v. 6283.
Author Heading
Japan Society of Applied Physics.
Hoga, Morihisa.
Publication, Distribution, etc.
Bellingham : SPIE
Publication Date
c2006.
Publication Date (W3CDTF)
2006