Structural and electrical properties of ultrathin nitrided gate dielectrics by plasma-assisted methods

Notes on use

Search by Bookstore

This page shows libraries in Japan other than the National Diet Library that hold the material.

Please contact your local library for information on how to use materials or whether it is possible to request materials from the holding libraries.

other

CiNii Research
Search Service
Paper
You can check the holdings of institutions and databases with which CiNii Research is linked at the site of CiNii Research.
Check the holdings of this book

You can check the details of this material, its authority (keywords that refer to materials on the same subject, author's name, etc.), etc.

Material Type: 博士論文
Title: Structural and electrical properties of ultrathin nitrided gate dielectrics by plasma-assisted methods
Author/Editor: Ruofeng Guo [著]
Author Heading: 郭, 若峰ガオ, ルオフェン
Publication, Distribution, etc.: [Ruofeng Guo]
Publication Date: [2006]
Publication Date (W3CDTF): 2006
Extent: 1冊
Alternative Title: プラズマ援用作製法による極薄窒化ゲート絶縁膜の構造及び電気特性プラズマエンヨウサクセイホウニヨルゴクウスチッカゲートゼツエンマクノコウゾウオヨビデンキトクセイ
Degree grantor/type: 金沢大学
Date Granted: 平成18年3月22日
Date Granted (W3CDTF): 2006
Dissertation Number: 甲第2660号
Degree Type: 博士 (学術)
Note (Dissertation): 博士論文
Place of Publication (Country Code): JP
Text Language Code: eng
Alias of Author: Guo, Ruofeng
NDLC: UT51
Note (General): 博士論文
Holding library: 国立国会図書館
Call No.: UT51-2006-N510
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000008384908
http://id.ndl.go.jp/bib/000008384908
Bibliographic Record Category (NDL): 213