A study on ultra thin and continuous CVD-Cu film for ULSI Cu interconnect

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Material Type: 博士論文
Title: A study on ultra thin and continuous CVD-Cu film for ULSI Cu interconnect
Author/Editor: 金勲 [著]
Author Heading: 金, 勲キム, フン
Publication, Distribution, etc.: [金勲]
Publication Date: [2006]
Publication Date (W3CDTF): 2006
Extent: 1冊
Alternative Title: ULSI多層配線用極薄連続CVD-Cu膜に関する研究 ULSI タソウハイセンヨウゴクウスレンゾク CVD - Cuマクニカンスルケンキュウ
Degree grantor/type: 東京大学
Date Granted: 平成18年9月29日
Date Granted (W3CDTF): 2006
Dissertation Number: 甲第21856号
Degree Type: 博士 (工学)
Note (Dissertation): 博士論文
Place of Publication (Country Code): JP
Text Language Code: eng
Alias of Author: Kim, Hoon
NDLC: UT51
Note (General): 博士論文
Holding library: 国立国会図書館
Call No.: UT51-2007-U27
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000009299211
http://id.ndl.go.jp/bib/000009299211
Bibliographic Record Category (NDL): 213