Emerging lithographic technologies 12 : 26-28 February 2008 : San Jose, California, USA. : 12th conference on emerging lithographic technologies : Feb 2008, San Jose, CA.

• Material Type: 図書
• ISBN (set): 9780819471062 (set)
• ISSN (series): 0277-786X
• Title: Emerging lithographic technologies 12 : 26-28 February 2008 : San Jose, California, USA. : 12th conference on emerging lithographic technologies : Feb 2008, San Jose, CA.
• Series Title: SPIE Proceedings ; 6921
• Title Heading: Proceedings of SPIE -- the International Society for Optical Engineering ; v. 6921.
• Author Heading: SEMATECH, Inc.; Schellenberg, F. M., 1959-
• Publication, Distribution, etc.: Bellingham : SPIE
• Publication Date: c2008.
• Publication Date (W3CDTF): 2008
• Extent: 2 parts : ill. ; 28 cm.
• Place of Publication (Country Code): US
• Text Language Code: eng
• Subject Heading: Lithography, Electron beam -- Congresses.; Microlithography -- Industrial applications -- Congresses.; X-ray lithography -- Congresses.; X-rays -- Industrial applications -- Congresses.; Masks (Electronics) -- Congresses.
• NDLC: M17
• Note (General): Papers.
• Note (Bibliography): Includes bibliographical references and author index.
• Holding library: 国立国会図書館
• Call No.: M17-08-1648
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 000009405222; http://id.ndl.go.jp/bib/000009405222
• OCLC No.: 230253668; https://www.worldcat.org/oclc/230253668
• Bibliographic Record Category (NDL): 215