Current and future trends of functional oxide films : April 17-21, 2006 : San Francisco, California, USA. : Apr 2006, San Francisco, CA. (Materials Research Society Symposia Proceedings ; 928)

Current and future trends of functional oxide films : April 17-21, 2006 : San Francisco, California, USA. : Apr 2006, San Francisco, CA.

(Materials Research Society Symposia Proceedings ; 928)

Call No. (NDL): M17-08-1544
Bibliographic ID of National Diet Library: 000009413560

Material type: 図書

Author: Materials Research Society. Meeting (2006 : San Francisco, Calif.)

Publisher: Materials Research Society

Publication date: c2006.

Material Format: Paper

Capacity, size, etc.: 186 p. : ill. ; 24 cm.

NDC: -

View All

Notes on use

Note (General)：: Papers."Spring 2006" -- on cover.

Search by Bookstore

Bibliographic Record

You can check the details of this material, its authority (keywords that refer to materials on the same subject, author's name, etc.), etc.

Paper

Material Type: 図書
ISBN: 9781558998858
Title: Current and future trends of functional oxide films : April 17-21, 2006 : San Francisco, California, USA. : Apr 2006, San Francisco, CA.
Series Title: Materials Research Society Symposia Proceedings ; 928
Title Heading: Materials Research Society symposia proceedings ; v. 928.
Author Heading: Materials Research Society. Meeting (2006 : San Francisco, Calif.)
Publication, Distribution, etc.: Warrendale : Materials Research Society
Publication Date: c2006.
Publication Date (W3CDTF): 2006
Extent: 186 p. : ill. ; 24 cm.
Place of Publication (Country Code): US
Text Language Code: eng
Subject Heading: Thin films -- Congresses.
Oxides -- Congresses.
NDLC: M17
Note (General): Papers.
"Spring 2006" -- on cover.
Note (Bibliography): Includes bibliographical references.
Holding library: 国立国会図書館
Call No.: M17-08-1544
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000009413560
http://id.ndl.go.jp/bib/000009413560
OCLC No.: 124148292
https://www.worldcat.org/oclc/124148292
Bibliographic Record Category (NDL): 215