Photomask and next-generation lithography mask technology 15 : 16-18 April 2008 : Yokohama, Japan. : Apr 2008, Yokohama, Japan. (SPIE Proceedings ; 7028)

Photomask and next-generation lithography mask technology 15 : 16-18 April 2008 : Yokohama, Japan. : Apr 2008, Yokohama, Japan.

(SPIE Proceedings ; 7028)

Call No. (NDL): M17-08-2201
Bibliographic ID of National Diet Library: 000009546509

Material type: 図書

Author: Horiuchi, Toshiyuki.

Publisher: SPIE

Publication date: c2008.

Material Format: Paper

Capacity, size, etc.: 2 parts : ill. (some col.) ; 28 cm.

NDC: -

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Note (General)：: Papers.

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Paper

Material Type: 図書
ISBN (set): 9780819472434 (set)
ISSN (series): 0277-786X
Title: Photomask and next-generation lithography mask technology 15 : 16-18 April 2008 : Yokohama, Japan. : Apr 2008, Yokohama, Japan.
Series Title: SPIE Proceedings ; 7028
Title Heading: Proceedings of SPIE -- the International Society for Optical Engineering ; v. 7028.
Author Heading: Horiuchi, Toshiyuki.
Publication, Distribution, etc.: Bellingham : SPIE
Publication Date: c2008.
Publication Date (W3CDTF): 2008
Extent: 2 parts : ill. (some col.) ; 28 cm.
Place of Publication (Country Code): US
Text Language Code: eng
Subject Heading: Masks (Electronics) -- Congresses.
Integrated circuits -- Masks -- Congresses.
X-ray lithography -- Congresses.
Microlithography -- Congresses.
Optoelectronic devices -- Design and construction -- Congresses.
NDLC: M17
Note (General): Papers.
Note (Bibliography): Includes bibliographical references and author index.
Holding library: 国立国会図書館
Call No.: M17-08-2201
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000009546509
http://id.ndl.go.jp/bib/000009546509
OCLC No.: 244884536
https://www.worldcat.org/oclc/244884536
Bibliographic Record Category (NDL): 215