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Physics and technology of high-k gate dielectrics 7. : 7th international symposium on high dielectric constant materials and gate stacks : 216th meeting of the Electrochemical Society : 2009 Vienna symposium : Oct 2009, Vienna, Austria. (ECS Transactions ; 25 (no. 6))

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Physics and technology of high-k gate dielectrics 7. : 7th international symposium on high dielectric constant materials and gate stacks : 216th meeting of the Electrochemical Society : 2009 Vienna symposium : Oct 2009, Vienna, Austria.

(ECS Transactions ; 25 (no. 6))

Call No. (NDL)
M17-10-1513
Bibliographic ID of National Diet Library
000010628498
Material type
図書
Author
-
Publisher
Electrochemical Society
Publication date
c2009.
Material Format
Paper
Capacity, size, etc.
x, 493 p. : ill. ; 23 cm.
NDC
-
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Paper

Material Type
図書
ISBN
9781566777438 (Hardcover)
9781607680932 (PDF)
ISSN
1938-6737 (online)
ISSN (series)
1938-5862 (print)
Title
Physics and technology of high-k gate dielectrics 7. : 7th international symposium on high dielectric constant materials and gate stacks : 216th meeting of the Electrochemical Society : 2009 Vienna symposium : Oct 2009, Vienna, Austria.
Series Title
ECS Transactions ; 25 (no. 6)
Publication, Distribution, etc.
Pennington : Electrochemical Society
Publication Date
c2009.
Publication Date (W3CDTF)
2009
Extent
x, 493 p. : ill. ; 23 cm.